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EMULSITONE COMPANY
19 Leslie Court
Whippany, New Jersey 07981
TEL. (973)386-0053
FAX (973)503-0256
EMULSITONE SOLUTION #187
Emulsitone Solution #187 is a solution designed to produce a thin glassy layer for use
in tri level photoprocessing, when a positive photo resist is used as the imaging layer.
SiO2 layers as produced by Silicafilm 13 prove inadequate for this specific
system since the SiO2 is dissolved by the alkaline developers used with
positive photo resists. Films of Emulsitone Solution #187 are insoluble in alkaline
solutions as used for positive resist develolpers.
Physical Properties Of Solution
Density: 0.834 +/- .02 at 25oC
Viscosity: 1.64 cp +/- .1 at 25oC
Contaminant Limits
| Na < 1 ppm | Cu < 1 ppm |
| Fe < 1 ppm | Ni < 1 ppm |
| Mn < 1 ppm | Zn < 1 ppm |
Film Deposition & Properties
Emulsitone Solution #187 is applied by spinning. The planarizing layer which may consist
of a thick layer of positive resist or of a polyimide should be well densified prior to
application of the Emulsitone Solution #187. Spinning at 3000 rpm will yield a 1700
angstrom film which will reduce to a thickness of 600 angstroms after densification at 200oC.
The film of Emulsitone Solution #187 is insoluable in 5% ammonium hydroxide solution and
will etch in a buffered HF solution at approximately 500 angstroms/minute. The film will
not be affected by an oxygen plasma.
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